Photoresist and Photoresist Ancillaries Market 2018: Global Demand, Trends, Growth, Share, Opportunities and Forecast till 2023

December 19 16:20 2018

Global Photoresist and Photoresist Ancillaries Market Growth Stimulated by Flourishing Semiconductor Industry
The global photoresist and photoresist ancillaries market has witnessed a steady growth over the past years. This has been a result of various factors such as rising production of high-density packaging, growing market for semiconductors and developments in NEMS.

According to the latest report by IMARC Group, titled “Photoresist and Photoresist Ancillaries Market: Global Industry Trends, Share, Size, Growth, Opportunity and Forecast 2018-2023”, the global photoresist and photoresist ancillaries market reached a value of US$ 3.1 Billion in 2017. Photoresists are light-sensitive organic materials that exhibit physical changes when exposed to radiation. They can be utilized in various processes such as photoengraving and photolithography. Photoresists are generally found in two forms which include positive tone resists and negative tone resists. Positive tone resists become soluble in the presence of UV light, whereas, the exposed areas of negative note resists become insoluble and cross-linked when subjected to UV light. Photoresist ancillaries are associated materials which are generally used during lithography. At present, majority of the products manufactured in the photoresist and photoresist ancillaries industry are solvent-based solutions including polymer resins, surfactants, cross-linking agents, electronic-grade solvents and stabilizers.

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Market Trends:

Photoresist and photoresist ancillaries are largely used for wiring configuration in high density packaging utilized for space electronics. Moreover, there has been a rise in the requirement of semiconductors as they enable communication and data processing in servers, smartphones, laptops and computers. In addition to this, the growing market for dynamic displays and developments in nanoelectromechanical systems (NEMS) will drive the demand for photoresist and photoresist ancillaries in the near future. However, the growth of the global photoresist and photoresist ancillaries market is being impeded by aqueous waste generated by photolithography processes which leads to the occurrence of occupational health hazards. Despite this hindrance, the market is expected to reach a value of US$ 4.4 Billion, registering a CAGR of about 6% during 2018-2023.

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Market Summary:

  • The photoresist market has been categorized on the basis of product type into KrF, g- and i-line, ArF dry, and ArF Immersion. Whereas, the different products included in the photoresist ancillaries market are anti-reflective coatings, removers, developers and others.
  • Based on application, the market is segregated into semiconductors and ICS, LCDs, printed circuit boards, and others.
  • On a regional basis, Asia Pacific represents the largest market for photoresist and photoresist ancillaries, holding the majority of the market share. The growth can be attributed to the escalating demand for semiconductor and ICs across the region. Some of the other major markets include North America, Europe, Middle East and Africa, and Latin America.
  • The competitive landscape of the market has also been examined with some of the key players being Tokyo Ohka Kogyo Co., Ltd., JSR Corporation, The DOW Chemical Company, Shin-Etsu Chemical Co. Ltd., Fujifilm Electronics Materials Co., Ltd., E. I. Du Pont De Nemours, Sumitomo Chemical Co., Ltd., Merck Az Electronics Materials, Allresist GmbH, Avantor Performance Materials, LLC, Microchemicals GmbH, etc.

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